スペックです http://www.fusionio.com/ioxtreme/specs.php Specifications Capacity: 80 GB NAND Type: Multi-Level Cell (MLC) Average Bandwidth: HD Tach 3.0.4.0 520 MB/s Burst Bandwidth: HD Tach 3.0.4.0 617 MB/s Latency: < 100 μs Mean Time Between Failure: 2,000,000 hours Write Endurance: 6 Years Form Factor: PCI Express (x4) Power: PCI Express Power Spec 1.1
システム環境 System Requirements Operating Systems: Windows XP 64-bit Windows Vista 64-bit Linux 64-bit Minimum Hardware: x86 processor 2 GB RAM x4 PCI-Express slot
34.1 Investigation of Ballistic Current in Scaled Floating-Gate NAND FLASH and a Solution, S. Raghunathan, T. Krishnamohan, K. Parat*, K. Saraswat, Stanford University, *Intel Corp.
For the first time, we investigate the ballistic transport that occurs across ultra-thin (fabricated upto 7nm) poly-Si FGs in scaled NAND FLASH and experimentally determine mean-free-path. We also demonstrate a solution using ultra-thin metal FG(fabricated upto 3nm) and show 1000X lesser ballistic current than poly-Si of same thickness.
34.2 The New Program/Erase Cycling Degradation Mechanism of NAND Flash Memory Devices, A. Fayrushin, K.S.Seol, J.H. Na, S.H. Hur, J.D. Choi, K. Kim, Samsung Electronics
Program/erase degradation model based on non-uniformly distributed trapped charge in tunnel oxide is suggested to explain midgap voltage and subthreshold slope change observed during program/erase cycling of current Flash memory. The model is supported by device structure analysis, experimental and simulation work
34.4 Reliability Improvement in Planar MONOS Cell for 20nm-node Multi-Level NAND Flash Memory and Beyond, W. Sakamoto, T. Yaegashi, T. Okamura, T. Toba, K. Komiya, K. Sakuma, Y. Matsunaga, Y. Ishibashi, H. Nagashima, M. Sugi, N. Kawada, M. Umemura, M. Kondo, T. Izumida, N. Aoki, T. Watanabe, Toshiba Corporation
20nm-node planar MONOS cell which has improved reliability is developed. Extremely wide program/erase Vth window and good retention characteristics after cycling stress are obtained by buried charge cell structure. The buried charge planar MONOS cell is suitable for Flash memory with 20nm-node and beyond.
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