【頑張れ国産】エルピーダ、ルネサス、東芝等国内半導体産業総合スレッドPart20 [08/06/29]
Nikon tops ASML for Intel's 32-nm node
SAN JOSE, Calif. ? In a major change in strategy, Intel Corp. has selected Nikon Corp.
over ASML Holding NV for a hotly-contested lithography order for the chip giant's 32-nm node, according to sources.
At 32-nm, Nikon has reportedly won the entire lithography business within Intel, leaving ASML out in the cold, source said.
The multi-million-dollar order represents Intel's initial scanners, based on immersion lithography.
Up until now, Intel had been using ''dry'' scanners for wafer processing within its fabs.
At 32-nm, Intel has reportedly switched gears and moved towards a single-vendor tool strategy--at least in lithography.
In other words, Intel will sole source its lithography requirements at 32-nm, by using Nikon. In the past, it had a dual-vendor strategy.
''It's a huge risk for Intel,'' said one source.
http://www.eetimes.com/news/semi/showArticle.jhtml;jsessionid=35TGTI0BOAYTQQSNDLOSKH0CJUNN2JVN?articleID=208803035
記事の要約。
intelが次期32nmプロセスで利用する液浸露光装置はNikonに決まった。
最新機種がいらないレイヤーでもNikonの露光装置の導入を推進する。
intelは嘗て最先端プロセス（45nm）ではASMLとNikonの両方の装置を使う戦略を取っていた。
しかし、32nmではNikonの装置に一本化が進む。
しかし、これは巨大なリスクでもある。
みたいな感じ。
Nikonは液浸に関してはASMLに絶対勝つと言っていたが、
現実味が出てきたね。
SAN JOSE, Calif. ? In a major change in strategy, Intel Corp. has selected Nikon Corp.
over ASML Holding NV for a hotly-contested lithography order for the chip giant's 32-nm node, according to sources.
At 32-nm, Nikon has reportedly won the entire lithography business within Intel, leaving ASML out in the cold, source said.
The multi-million-dollar order represents Intel's initial scanners, based on immersion lithography.
Up until now, Intel had been using ''dry'' scanners for wafer processing within its fabs.
At 32-nm, Intel has reportedly switched gears and moved towards a single-vendor tool strategy--at least in lithography.
In other words, Intel will sole source its lithography requirements at 32-nm, by using Nikon. In the past, it had a dual-vendor strategy.
''It's a huge risk for Intel,'' said one source.
http://www.eetimes.com/news/semi/showArticle.jhtml;jsessionid=35TGTI0BOAYTQQSNDLOSKH0CJUNN2JVN?articleID=208803035
記事の要約。
intelが次期32nmプロセスで利用する液浸露光装置はNikonに決まった。
最新機種がいらないレイヤーでもNikonの露光装置の導入を推進する。
intelは嘗て最先端プロセス（45nm）ではASMLとNikonの両方の装置を使う戦略を取っていた。
しかし、32nmではNikonの装置に一本化が進む。
しかし、これは巨大なリスクでもある。
みたいな感じ。
Nikonは液浸に関してはASMLに絶対勝つと言っていたが、
現実味が出てきたね。
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